Lub cev vapor deposition (Physical Vapor Deposition, PVD) thev naus laus zis hais txog kev siv lub cev txoj hauv kev hauv lub tshuab nqus tsev kom vaporize qhov chaw ntawm cov khoom siv (khoom los yog kua) rau hauv cov pa roj carbon monoxide lossis cov molecules, lossis ib nrab ionize rau hauv ions, thiab dhau los ntawm qis. - siab roj (los yog plasma). Txheej txheem, ib lub tshuab rau depositing ib tug nyias zaj duab xis nrog ib tug tshwj xeeb muaj nuj nqi ntawm ib tug substrate, thiab lub cev vapor deposition yog ib tug ntawm lub ntsiab kev kho mob technologies. PVD (lub cev vapor deposition) txheej tshuab yog tsuas yog muab faib ua peb pawg: nqus evaporation txheej, nqus sputtering txheej thiab nqus ion txheej.
Peb cov khoom yog tsuas yog siv nyob rau hauv thermal evaporation thiab sputtering txheej. Cov khoom siv nyob rau hauv vapor deposition muaj xws li tungsten strand hlau, tungsten tej nkoj nquam, molybdenum nkoj, thiab tantalum tej nkoj nquam cov khoom siv nyob rau hauv electron beam txheej yog cathode tungsten hlau, tooj liab crucible, tungsten crucible, thiab molybdenum ua qhov chaw Cov khoom siv nyob rau hauv sputtertanium txheej. lub hom phiaj, chromium lub hom phiaj, thiab titanium-aluminium lub hom phiaj.
